1 北京交通大学光电子技术研究所，北京 100044
2 北京太阳能电力研究院有限公司，北京 101102
3 鲁东大学物理与光电工程学院，山东 烟台 264025
4 北京交通大学发光与光信息技术教育部重点实验室，北京 100044
设计了两种具有不同参数的光刻掩模版，利用光刻技术制备了两种微米级双层复合结构。研究了曝光能量对凹形缺口深度的影响，同时采用有限差分时域法分析了掩模版曝光时的光场分布情况，阐明了微米级双层复合结构形成的物理机理。实验结果表明：通过调整曝光能量的大小，能够有效地控制凹形缺口的深度。对8 μm厚的AZ9260光刻胶来说，不高于160 mJ/cm2的曝光能量是制备出微米级双层复合结构的关键。该技术在制备微米尺寸的分层器件方面有着潜在的应用前景。
光学器件 微结构制造 光刻 微米级双层复合结构 有限差分时域法
Author Affiliations
Abstract
1 School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, China
2 Engineering Research Center of Optical Instrument and System, Ministry of Education, Shanghai Key Laboratory of Modern Optical System, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
In this Letter, we propose a simple and effective approach for transforming a conventional Talbot array illuminator (TAI) with multilevel phase steps into a binary-phase TAI (BP-TAI) through detour phase encoding. The BP-TAI is a binary (0 π) phase-only diffractive optical element, which can be utilized to generate a large-scale focal spots array with a high compression ratio. As an example, we design a square BP-TAI with the fraction parameter β = 15 for achieving a square multifocal lattice with a high compression ratio β2. Theoretical analysis and experimental results demonstrate that the detour phase encoding is efficient for designing the BP-TAI, especially with the high compression ratio. Such results may be exploited in practical large-scale optical trapping and X-ray imaging.
050.1950 Diffraction gratings 070.6760 Talbot and self-imaging effects 050.1380 Binary optics Chinese Optics Letters
2019, 17(7): 070501
